C$1,269

Description

negative working dry film resist for printmaking and fine arts to produce photo etching and photogravure.
as an etch resist for modeling and pcb production in electronics | for jewellery copper steel and iron e.g knive making.
and ferric chloride resistant.
Thickness: 50 micron, colour: blue, exposure time depending on UV-light source: 3-30 seconds.
to strip the exposed photopolymer resist off the plate submerge in alcohol or acetone.

resistant dry photopolymer film resist with high resolution and very fast exposure. Best choice for the production of printing plates for intaglio ( photo etching | photogravure ), to etch pcbs in DIY electronics, for subtle etching of brass in modelling and as ing tape for sandblasting. Further fields of application: as an etch resist for glass, stone, jewellery and blades. With Photopolymerfilm F4000 fast, precise and reliable results can be achived. Usage: Lamination: The film is sandwiched between two protective layers of mylar. Remove the inner protective mylar ( the inner mylar is a little softer and thicker than the outer protective mylar ). wet lamination method: Spray the uncovered sid of the film and the surface of the object that should be covered evenly with a spray bottle filled with distilled water. Then squeege out all water and s with a rubber squeegie. After that the plate should be allowed to dry for at least one hour in darkness. Exposure: print out a positive with an inkjet printer. For printing a positive a wide range of trasparencies is suitable. Best results can be achieved by using repro film for screenprinting. Printer driver settings are: Photo Glossy Paper and black/white to obtain an opaque transparency. Light sources can be everything that emmitts uv-light: terrarium lamps,work spot lights, exposure units and last but not least simply the sun. Exposing in the sun produces very precise and good results as long as the different exposure times are determined ( seasons, daytime ) Exposure time in Juli from 12 - 20 o'clock : 3 seconds Development: Prepare a solution of 1 percent of developer and water ( 1 liter water + 10 gram developer ) in a tray. Remove the protective mylar from the film surface and put the plate into the developer. Leave it in there for at least 1 minute. Then rinse in cold tap water for about 1,5 minutes. . The plate is now ready for etching

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Dry Film Resist Photopolymer Film for Etching and Electroplating Resistant | Set with Developer 1 Meter + 290g Developer

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